Single and two-photon litography

  • Single photon large volume lithography system with a digitally addressable projection system for biological and material applications.
  • High accuracy positioning of sample stage and objective using an interferometric closed loop.
  • Precision two-photon lithography system with acoustooptics laser beam steering system for very fast and accurate microstructures writing.
  • Development of writing strategies and special techniques for high-volume, high-resolution printing.
  • Interference and holographic recording of microstructures using modulators and DLP technology.
  • Beam shaping of writing beam by spatial modulators.
  • Refraction and diffraction optics design and manufacturing.

In collaboration with


Optical fiber holders made by two-photon stereolithography for optical levitation under reduced pressure.


A Fresnel lens composed of concentric circular rings.


A two-photon lithograph for the fabrication of planar and semi-planar structures with an acousto-optic deflection system and femtosecond pulse spatial and temporal dispersion compensation